Pre-bake and Post-bake with Oven

Lithography Equipment

After coating the photoresist onto the sample, a pre-bake step at a temperature of about 70-80 °C is needed to remove excess solvents. Moreover, after lithography and emergence of the pattern, a post-bake process is required which ensures the sufficient strength of the resist film against the chemical etchants that are used in the subsequent steps of sample processing. This step is usually carried out at 110-120 °C. In this regard, an oven with temperature accuracy of 1 °C is use.




  • 30 Minutes at 80 °C

    Unit Each Layer Amount : 250,000 Rls.
  • 15 Minutes at 120 °C

    Unit Each Layer Amount : 125,000 Rls.