Lithography with Mask Aligner

Lithography Equipment

Undoubtedly, lithography and mask aligner are one of the most important equipment of nanoelectronics FABs. This device is used to create a mask pattern onto the sample. Use of mask aligner in order to align the new mask with the created pattern by previous mask is also necessary.

Motorized scan stages and precise mechanical system for movement of sample and mask, as well as highly uniform UV light source facilitates lithography process and aligning of patterns relative to each other with high precision, which consequently results in obtaining smaller feature sizes.

 

 

Service

  • Active Area of 10 cm with Feature Size more than 10 μm and with Etching

    Unit Each Layer Amount : 1,000,000 Rls.
  • Active Area of 10 cm with Feature Size in the Range of 4 to 10 μm and with Etching

    Unit Each Layer Amount : 1,500,000 Rls.
  • Active Area of 10 cm with Feature Size in the Range of 1 to 4 μm and with Etching

    Unit Each Layer Amount : 3,000,000 Rls.
  • Active Area of 5 cm with Feature Size more than 2 μm

    Unit Each Layer Amount : 1,000,000 Rls.