Design of Mask

Lithography Equipment

Relying on sufficient experience in the design of different types of masks in the process of fabrication of transistor, various types of acceleration sensors, flow and gas sensors, and a variety of MEMS/ NEMS complicated devices, etc.,  The INEC technical team is ready to serve the technicians of this field.

The design is performed using the Corel Draw or Freehand softwares, and it will be printed after being validated by applicant. Considering the existing facilities in the country, Feature Size below 2 μm is not recommended in design.


  • Using Free-hand, and Corel Draw

    Unit Each Mask Amount : 1,000,000 Rls.