Spin Coater

Lithography Equipment

Spin coating is a common method for deposition of uniform thin films of different materials (often polymers) on a flat substrate. In this process, usually a polymer material such as a light-sensitive material (photoresist), PMMA, PDMS, SU8, etc., is used for lithography of sensors, actuators, and nano- or microfluidic devices. This process, particularly in the microelectronics industry and MEMS/ NEMS, is mainly used to apply photoresist to the surface of a silicon wafer for lithography. The aim of spin coating with high-quality is production of a uniform layer with predictable and reproducible thickness.

 

 

Service

  • Various Types of Polymers up to 8000 rpm

    Unit Each Sample Amount : 250,000 Rls.
  • Various Types of Polymers up to 8000 rpm

    Unit Each Hour Amount : 1,000,000 Rls.