Wafer Cleaning Machine

Sample Preparation

In order to remove metallic and organic residues, silicon wafers with any crystalline orientation are cleaned using Piranha standard solution, a 3: 1 mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2).

In order to eliminate ionic, organic and metallic residues, silicon wafers with any crystalline orientation are cleaned using RCA standard solution, a 1: 1: 5 mixture of ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), and Water (H2O).

Service

  • RCA Solution

    Unit Each Run Amount : 600,000 Rls.
  • DCM Solution

    Unit Each Run Amount : 750,000 Rls.
  • Piranha Solution

    Unit Each Run Amount : 500,000 Rls.